Femix_HassakuXL

FeMix_HassakuXL is a series of Stable Diffusion XL models designed for generating anime-style images, employing a unique blend strategy to combine different aesthetic styles. The series ranges from highly stylized and experimental blends to stable, high-quality models suitable for general use. FeMix_HassakuXL merges two distinct models and concepts of each blend, to achieve various output depending on users needs.

Recommended Prompts & Settings

Quality Prompts: masterpiece, best quality, detailed
Negative Prompts: worst quality, bad quality, sketch. Adding "signature" can help remove unintended watermarks.
High-Quality faces: Put nose into the negative prompt for smooth faces, if you feel that Style A gets too prominent.
Sampling Method: DPM++ 2M Karras. Some users experience good results with Euler A and different samplers due to having weaker style implementation to improve image creation.
General Settings: Resolution 832x1216. Try varying different resolutions for unique image output.

General Recommendations:

Avoid overloading the model with lengthy prompts. Its versatility is also its weakness, as too much information can lead to unpredictable results.

Excluded metadata and franchise tags, so please do not use them.

Negative Recommendations:

* Avoid using disruptive features: floating texts, logos, watermarks, speak bubbles, signatures. If those results occur, add "signature" into the negative prompt.

* Excluded metadata and franchise tags, do not use them.

Recommended Resolutions (SDXL):

* 1024 x 1024

* 1152 x 896

* 896 x 1152

* 1216 x 832

* 832 x 1216 (most recommended)

* 1344 x 768

* 768 x 1344

* 1536 x 640

* 640 x 1536

License Info:

This model merges aspects from ANIMAGINE XL 3.0 (pre-V1) and Illustrious-XL & WAI-NSFW-illustrious-SDXL (V1 onwards):

Fair AI Public License 1.0-SD.

Description

Blend Ratio: 40% Style A, 60% Style B. This blend shifts the focus further towards the distinctive style of Style B, while retaining a base level of structure from Style A.
Emphasis on Style B Characteristics: Expect a strong influence from Style B, including its unique aesthetic, potential for stylized lighting, and overall experimental feel.
Increased Artifact Potential: Artifacts, especially around the eyes, are more likely compared to models with a higher Style A percentage. Expect this and plan to counter it in your workflow.
LoRA Effectiveness Considerations: LoRA models might have a reduced and less predictable impact compared to models with more Style A. Carefully test LoRAs and adjust their strengths accordingly. Prioritize core LoRA concepts rather than relying on subtle detail preservation.
Prompt Refinement Required: Prompting might require more experimentation to achieve desired results. Standard prompts optimized for Style A will likely need adjustments to work effectively with this blend. Focus on broad concepts rather than hyper-specific details.
Compositional Considerations: Style B can sometimes lead to unconventional or experimental compositions. Be prepared to adjust your prompts or use tools to influence the overall layout if needed.
Creative Exploration Focus: This version is geared towards users seeking to explore unconventional and artistic visuals with a distinctive flavor. It embraces the unique aspects of Style B, even with potential imperfections.
Highres Fix/Adetailer are essential: For clean results.

In summary: Style A4B6 is a blend designed to explore Style B's potential, with a focus on unique visuals and experimental outcomes. This version requires a willingness to address potential artifacts and a flexible approach to prompting. It's recommended for users who prioritize stylistic exploration over absolute stability and predictability.