Femix_HassakuXL

FeMix_HassakuXL is a series of Stable Diffusion XL models designed for generating anime-style images, employing a unique blend strategy to combine different aesthetic styles. The series ranges from highly stylized and experimental blends to stable, high-quality models suitable for general use. FeMix_HassakuXL merges two distinct models and concepts of each blend, to achieve various output depending on users needs.

Recommended Prompts & Settings

Quality Prompts: masterpiece, best quality, detailed
Negative Prompts: worst quality, bad quality, sketch. Adding "signature" can help remove unintended watermarks.
High-Quality faces: Put nose into the negative prompt for smooth faces, if you feel that Style A gets too prominent.
Sampling Method: DPM++ 2M Karras. Some users experience good results with Euler A and different samplers due to having weaker style implementation to improve image creation.
General Settings: Resolution 832x1216. Try varying different resolutions for unique image output.

General Recommendations:

Avoid overloading the model with lengthy prompts. Its versatility is also its weakness, as too much information can lead to unpredictable results.

Excluded metadata and franchise tags, so please do not use them.

Negative Recommendations:

* Avoid using disruptive features: floating texts, logos, watermarks, speak bubbles, signatures. If those results occur, add "signature" into the negative prompt.

* Excluded metadata and franchise tags, do not use them.

Recommended Resolutions (SDXL):

* 1024 x 1024

* 1152 x 896

* 896 x 1152

* 1216 x 832

* 832 x 1216 (most recommended)

* 1344 x 768

* 768 x 1344

* 1536 x 640

* 640 x 1536

License Info:

This model merges aspects from ANIMAGINE XL 3.0 (pre-V1) and Illustrious-XL & WAI-NSFW-illustrious-SDXL (V1 onwards):

Fair AI Public License 1.0-SD.

Description

Blend Ratio: 20% Style A, 80% Style B. This blend heavily emphasizes the distinctive and experimental style of Style B, resulting in a model that's significantly different from its Style A origins.
Dominant Style B Influence: Expect a very strong and pronounced influence from Style B across all aspects of image generation, including aesthetics, lighting, and composition.
High Artifact Likelihood: Artifacts, especially around the eyes and in detailed areas, are highly probable due to the overwhelming influence of Style B. Expect to spend significant time and effort mitigating these issues.
Drastically Reduced LoRA Effectiveness: LoRA models will likely have a minimal and unpredictable impact. Consider them primarily as subtle influences rather than precise control mechanisms.
Significant Prompting Challenges: Prompting will require a highly experimental and iterative approach. Traditional prompts may not work effectively, and you'll need to develop strategies tailored specifically to Style B's characteristics. Focus on high-level concepts and artistic keywords.
Compositional Experimentation: Style B may result in highly unconventional or even chaotic compositions. Be prepared to embrace this and find creative ways to work with it.
Niche Artistic Applications: This version is suitable only for users seeking extremely stylized and experimental results and are willing to invest significant effort to overcome potential limitations. It may be ideal for specific artistic styles or challenging creative prompts.
Highres Fix/Adetailer is MANDATORY: To salvage usable results.
Embrace Imperfection: This model is about exploring the boundaries of what's possible and embracing unexpected results. Don't aim for perfection; instead, focus on finding unique and compelling visuals within the chaos.

In summary: Style A2B8 is a highly experimental blend designed to push the limits of Style B. It's not for the faint of heart and requires a deep understanding of Style B's quirks and limitations. This version is primarily for artistic exploration and embracing the unexpected. It's NOT recommended for general-purpose use.